Linear guide in the field of semiconductor wafer processing application advantages
Linear guide in the field of semiconductor wafer processing application of significant advantages, specifically reflected in the following aspects:
High-precision positioning: In response to the demand for high precision in the photolithography process, ceramic linear guide is adopted, with roughness Ra <0.05μm after special polishing treatment, and with advanced drive and feedback system, sub-micrometer accurate positioning can be realized. This ensures the precise alignment of the mask plate and wafer in the photolithography process, guaranteeing the accuracy of the chip's critical dimensions (CD), such as a 12-inch wafer fab after the application of the key dimensions of the chip manufacturing deviation reduced by 40%, which greatly improves the precision and yield of chip manufacturing.
High cleanliness: semiconductor manufacturing environment requires a very high degree of cleanliness, ceramic linear guide itself is not easy to adsorb particles, and can run stably in a vacuum environment, effectively reducing the impurities generated by the guide on the wafer pollution, to avoid defects due to the particles adhering to the chip caused by the chip, to ensure that the chip manufacturing process of cleanliness.
High stability and strong responsiveness: in etching and other processes, wafer processing, there are frequent start-stop and direction change, optimized ball circulation system after the linear guide, can make the slider commutation acceleration up to 15G, at the same time, the smoothness of movement error control at ± 0.002mm, to ensure that the complex movement conditions can still be stable operation for the continuity of wafer processing and stability to provide protection, improve production efficiency. The system is designed to provide continuity and stability for wafer processing and improve production efficiency.
